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Advances in Imaging and Electron Physics

  • 1st Edition, Volume 193 - January 28, 2016
  • Latest edition
  • Editor: Peter W. Hawkes
  • Language: English

Advances in Imaging and Electron Physics merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy.… Read more

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Description

Advances in Imaging and Electron Physics merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy.

The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

Key features

  • Contains contributions from leading authorities on the subject matter
  • Informs and updates on all the latest developments in the field of imaging and electron physics
  • Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electron, and ion emission with a valuable resource
  • Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing

Readership

Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general.

Table of contents

Chapter One: Utilizing the Eigen-Emittance Concept for Bright Electron Beams

  • Abstract
  • 1 Introduction
  • 2 Theory
  • 3 Construction of Initial Distributions
  • 4 Applications to Bright Electron Beams
  • 5 Summary and Discussion

Chapter Two: Analytical Methods for the Calculation and Simulation of New Schemes of Static and Time-of-Flight Mass Spectrometers

  • Abstract
  • 1 Introduction
  • 2 Analytical Equations for Calculating the Dynamics of the Charged Particle Beam and Their General Properties
  • 3 Analytical Methods of Calculating 2D Fields and Fields Reduced to the 2D Ones
  • 4 Numerical Calculation of Instrument Characteristics of Static and TOF Mass Spectrometers
  • 5 Summary and Conclusions
  • Acknowledgments

Product details

  • Edition: 1
  • Latest edition
  • Volume: 193
  • Published: January 28, 2016
  • Language: English

About the editor

PH

Peter W. Hawkes

Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
Affiliations and expertise
Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, France

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