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Advances in Imaging and Electron Physics

  • 1st Edition, Volume 199 - March 15, 2017
  • Latest edition
  • Editor: Peter W. Hawkes
  • Language: English

Advances in Imaging and Electron Physics, Volume 199, the latest release in a series that merges two long-running serials, Advances in Electronics and Electron Physics and Advances… Read more

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Description

Advances in Imaging and Electron Physics, Volume 199, the latest release in a series that merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy features extended articles on the physics of electron devices (especially semiconductor devices). Specific topics include discussions on Micro-XRF in scanning electron microscopes, and an interesting take on the variational approach for simulation of equilibrium ion distributions in ion traps regarding Coulomb interaction, amongst others. Users will find a comprehensive resource on the most important aspects of particle optics at high and low energies, microlithography, image science and digital image processing.

In addition, topics of interest, including electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains are presented and discussed.

Key features

  • Contains contributions from leading authorities on the subject matter
  • Informs and updates on all the latest developments in the field of imaging and electron physics
  • Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electron, and ion emission with a valuable resource
  • Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing

Readership

Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general

Table of contents

Chapter One: Micro-XRF in Scanning Electron Microscopes

  • Abstract
  • 1 Introduction
  • 2 Differences and Synergies of SEM-EDS and μ-XRF
  • 3 Design of an Microspot X-Ray Source for SEM
  • 4 Performing a Measurement
  • 5 Applications
  • 6 Summary

Chapter Two: A Variational Approach for Simulation of Equilibrium Ion Distributions in Ion Traps With Regard to Coulomb Interaction

  • Abstract
  • 1 Introduction
  • 2 Physical Grounds of the Simulation Method
  • 3 Simulation Results
  • 4 Conclusion
  • Acknowledgment

Chapter Three: Analytical Review of Direct Stem Imaging Techniques for Thin Samples

  • Abstract
  • 1 Introduction
  • 2 Linear CBED COM STEM Imaging Techniques
  • 3 STEM Imaging Techniques Using a Symmetric Scalar Detector
  • 4 STEM Imaging Using an Antisymmetric Vector Detector: iDPC
  • 5 Experimental Results Using iDPC-STEM Imaging
  • 6 Summary and Conclusions
  • Acknowledgments
  • Appendix A Resolution of STEM Imaging
  • Appendix B Derivation of the Ideal, Linear COM STEM Vector Image Formation Formula
  • Appendix C Derivation of the General, Nonlinear STEM Image Formation Formula
  • Appendix D CTFs for Aberration-Free MIDI-STEM
  • Appendix E Determination of the Scaling Factors in the Fourier Series in Azimuthal Direction for Wedge-Shaped DPC Detectors
  • Appendix F CTFiS and CTFiC for the COM-STEM Detector
  • Appendix G List of Abbreviations

Chapter Four: Quantum Nanooptics in the Electron Microscope

  • Abstract
  • 1 Introduction
  • 2 Quantum Optics
  • 3 Primary Excitations in Bulk and Quantum-Confined Materials
  • 4 CL Phenomenon
  • 5 Single-Photon Detection in the Electron Microscope
  • 6 Light Bunching in CL
  • 7 Lifetime Measurements at the Nanometer Scale
  • 8 Perspectives
  • Acknowledgments

Chapter Five: Component Identification and Interpretation: A Perspective on Tower of Knowledge

  • Abstract
  • 1 Introduction
  • 2 Component Identification by a Voting Method
  • 3 Component Interpretation by ToK
  • 4 Conclusions

Product details

  • Edition: 1
  • Latest edition
  • Volume: 199
  • Published: March 20, 2017
  • Language: English

About the editor

PH

Peter W. Hawkes

Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
Affiliations and expertise
Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, France

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