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Elsevier

Advances in Research and Development

Modeling of Film Deposition for Microelectronic Applications

  • 1st Edition, Volume 22 - October 22, 1996
  • Latest edition
  • Editors: Ronald Powell, John L. Vossen, Maurice H. Francombe, Abraham Ulman
  • Language: English

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the proper… Read more

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Description

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.

Readership

Researchers in thin films; AVS; microelectronics and computer simulation in this field.

Table of contents

M.J. Brett, S.K. Dew, and T.J. Smy, Thin Film Microstructure and Process Simulation Using SIMBAD. S. Hamaguchi, Mathematical Methods for Thin Films Deposition Simulations. C.-C. Fang, V. Prasad, R.V. Joshi, F. Jones, and J.J. Hsieh, A Process Model for Sputter-Deposition of Thin Films Using Molecular Dynamics. T.S. Cale and V. Mahadev, Feature Scale Transport and Reaction during Low Pressure. Chapter References. Author Index. Subject Index.

Product details

  • Edition: 1
  • Latest edition
  • Volume: 22
  • Published: January 29, 1997
  • Language: English

About the editors

RP

Ronald Powell

Affiliations and expertise
Novellus Systems, Inc., Palo Alto, California

JV

John L. Vossen

Affiliations and expertise
RCA Laboratories, Princeton, New Jersey

MF

Maurice H. Francombe

Affiliations and expertise
Georgia State University, Atlanta, U.S.A.

AU

Abraham Ulman

Affiliations and expertise
Polytechnic University, Brooklyn, New York, U.S.A.

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