Frontiers of Thin Film Technology
- 1st Edition, Volume 28 - October 20, 2000
- Latest edition
- Editors: Stephen M. Rossnagel, Maurice H. Francombe, Abraham Ulman
- Language: English
Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and charac… Read more
Description
Description
Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures.
Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.
Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.
Readership
Readership
Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.
Product details
Product details
- Edition: 1
- Latest edition
- Volume: 28
- Published: November 7, 2000
- Language: English
About the editors
About the editors
SR
Stephen M. Rossnagel
Affiliations and expertise
IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York, U.S.A.MF
Maurice H. Francombe
Affiliations and expertise
Georgia State University, Atlanta, U.S.A.AU
Abraham Ulman
Affiliations and expertise
Polytechnic University, Brooklyn, New York, U.S.A.View book on ScienceDirect
View book on ScienceDirect
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