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Frontiers of Thin Film Technology

  • 1st Edition, Volume 28 - October 20, 2000
  • Latest edition
  • Editors: Stephen M. Rossnagel, Maurice H. Francombe, Abraham Ulman
  • Language: English

Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and charac… Read more

Description

Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures.

Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.

Readership

Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.

Product details

  • Edition: 1
  • Latest edition
  • Volume: 28
  • Published: November 7, 2000
  • Language: English

About the editors

SR

Stephen M. Rossnagel

Affiliations and expertise
IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York, U.S.A.

MF

Maurice H. Francombe

Affiliations and expertise
Georgia State University, Atlanta, U.S.A.

AU

Abraham Ulman

Affiliations and expertise
Polytechnic University, Brooklyn, New York, U.S.A.

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