Ion Implantation and Beam Processing

List of Contributors

Preface


1 Introduction to Implantation and Beam Processing

I. Beams and Materials

II. Amorphization and Crystallization

III. Fundamental Processes

IV. Semiconductor Technology and Applications


2 Amorphization and Crystallization of Semiconductors

I. Introduction

II. Implantation Damage and Amorphization

III. Solid-Phase Crystallization

IV. Liquid-Phase Crystallization

V. Thermodynamic Considerations

VI. Amorphization and Crystallization Perspectives

References


3 Application of the Boltzmann Transport Equation to Ion Implantation in Semiconductors and Multilayer Targets

I. Introduction

II. Range Distributions in Multilayer Targets

III. Damage Distribution in Semiconductors

IV. Summary

References


4 High Energy Density Collision Cascades and Spike Effects

I. Introduction

II. Collision Cascade Concepts

III. Experimental Examples of Spike Effects

IV. Thermal Spike Concepts

V. Conclusions

References


5 Implantation of Insulators: Ices and Lithographic Materials

I. Introduction

II. Ion Erosion of Condensed Gas Films

III. Ion Beam Lithography

IV. Conclusions

References


6 Ion-Bombardment-Induced Composition Changes in Alloys and Compounds

I. Introduction

II. Sputtering of Elemental Targets

III. Sputtering of Two-Component Systems

IV. Particle Fluxes at the Surface

V. High Fluence Ion Implantation

VI. Conclusions

References


7 Ion Beam and Laser Mixing: Fundamentals and Applications

I. Introduction

II. Fundamental Mechanisms

III. Materials Alterations Induced by Ion Beam and Pulsed Laser Processing

IV. Concluding Remarks

References


8 High-Dose Implantation

I. Introduction

II. Implanting at High Doses

III. Effect of Implant Temperature on Damage

IV. Behaviour of High-Dose Implants

V. High-Dose Ion Implanters

VI. Summary

References


9 Trends of Ion Implantation in Silicon Technology

I. Introduction

II. Heavily N-Doped Silicon

III. Interactive Effects in Double-Implanted Profiles

IV. Diffusion from Implanted Polysilicon

V. Summary and Conclusions

References


10 Implantation in Ga As Technology

I. Introduction

II. Annealing Techniques

III. Low Dose N-Type Implants

IV. High Dose N-Type Implants

V. P-Type Implants

VI. Summary and Conclusions

References


11 Contacts and Interconnections on Semiconductors

I. Introduction

II. Silicon

III. Gallium Arsenide

IV. Conclusion

References

Index