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Ion Implantation Science and Technology

  • 1st Edition - January 1, 1984
  • Latest edition
  • Editor: J.F. Ziegler
  • Language: English

Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided… Read more

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Description

Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.

Table of contents


Contents

Contributors

Preface

Part I: Ion Implantation Science

The Historical Development of Ion Implantation

The Stopping and Range of Ions in Solids

Ion Implantation Damage in Silicon

Damage Annealing in Silicon and Electrical Activity

Measurement of Electrically Active Dopants

Ion Implantation Metallurgy

Part II: Ion Implantation Technology

Ion Implantation System Concepts

An Introduction to Ion Sources

Some Principles Underlying Ion Optics Design

Mapping of Ion Implanted Wafers

Measurement and Control of Ion Implantation Accelerator Parameters

Ion Implantation: Safety and Radiation Considerations

Index

Product details

  • Edition: 1
  • Latest edition
  • Published: January 1, 1984
  • Language: English

About the editor

JZ

J.F. Ziegler

Affiliations and expertise
IBM Research, Yorktown Heights, NY, USA

View book on ScienceDirect

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