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Ion Implantation Science and Technology

  • 2nd Edition - June 28, 1988
  • Latest edition
  • Editor: J.F. Ziegler
  • Language: English

Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved… Read more

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Description

Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved in the subject. The book is divided into two parts - Part 1: Ion Implantation Science and Part 2: Ion Implantation Technology. Part 1 covers topics such as the stopping and range of ions in solids; ion implantation damage in silicon; experimental annealing and activation; and the measurement on ion implantation. Part 2 includes ion optics and focusing on implanter design; photoresist problems and particle contamination; ion implantation diagnostics and process control; and emission of ionizing radiation from ion implanters. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.

Table of contents


Contents

Contributors

Preface

Part I: Ion Implantation Science

The Stopping and Range of Ions in Solids

Ion Implantation Damage in Silicon

Experimental Annealing and Activation

Measurement of Ion Implantation

Part II: Ion Implantation Technology

An Introduction to Ion Sources

Ion Optics and Focusing in Implanter Design

Wafer Cooling, Faraday Design and Wafer Charging

Photoresist Problems and Particle Contamination

Ion Implantation Diagnostics and Process Control

Safety Considerations for Ion Implanters

Emission of Ionizing Radiation from Ion Implanters

Index

Product details

  • Edition: 2
  • Latest edition
  • Published: June 28, 1988
  • Language: English

About the editor

JZ

J.F. Ziegler

Affiliations and expertise
IBM Research, Yorktown Heights, NY, USA

View book on ScienceDirect

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