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Principles of Electron Optics, Volume 2

Applied Geometrical Optics

  • 2nd Edition - December 13, 2017
  • Latest edition
  • Authors: Peter W. Hawkes, Erwin Kasper
  • Language: English

Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1:… Read more

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Description

Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1: electrostatic and magnetic lenses, quadrupoles, cathode-lens-based instruments including the new ultrafast microscopes, low-energy-electron microscopes and photoemission electron microscopes and the mirrors found in their systems, Wien filters and deflectors. The chapter on aberration correction is largely new. The long section on electron guns describes recent theories and covers multi-column systems and carbon nanotube emitters. Monochromators are included in the section on curved-axis systems.

The lists of references include many articles that will enable the reader to go deeper into the subjects discussed in the text.

The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography.

Key features

  • Offers a fully revised and expanded new edition based on the latest research developments in electron optics
  • Written by the top experts in the field
  • Covers every significant advance in electron optics since the subject originated
  • Contains exceptionally complete and carefully selected references and notes
  • Serves both as a reference and text

Readership

Postgraduate students and teachers in physics and electron optics; researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy, and nanolithography

Table of contents

PART VII – INSTRUMENTAL OPTICS

35. Electrostatic Lenses

35.1. Introduction

35.2. Immersion lenses

35.3. Einzel lenses

35.4. Grid or foil lenses

35.5. Cylindrical lenses

36. Magnetic Lenses

36.1. Introduction

36.2. Field models

36.3. Measurements and universal curves

36.4. Ultimate lens performance

36.5. Lenses of unusual geometry

36.6. Special purpose lenses

37. Electron Mirrors, Low-energy-electron Microscopes and Photoemission Electron Microscopes, Cathode Lenses and Field-emisssion Microscopy

37.1. The electron mirror microscope

37.2. Mirrors in energy analysis

37.3. Cathode lenses, low-energy-electron microscopes and photoemission electron microscopes

37.4. Field-emission microscopy

37.5. Ultrafast electron microscopy

38. The Wien Filter

39. Quadrupole Lenses

39.1. Introduction

39.2. The rectangular and bell-shaped models

39.3. Isolated quadrupoles and doublets

39.4. Triplets

39.5. Quadruplets

39.6. Other quadrupole geometries

40. Deflection Systems

40.1. Introduction

40.2. Field models for magnetic deflection systems

40.3. The variable-axis lens

40.4. Alternative concepts

40.5. Deflection modes and beam-shaping techniques

PART VIII – ABERRATION CORRECTION AND BEAM INTENSITY DISTRIBUTION (CAUSTICS)

41. Aberration Correction

41.1. Introduction

41.2. Multipole correctors

41.3. Foil lenses and space charge

41.4. Axial conductors

41.5. Mirrors

41.6. High-frequency lenses

41.7. Other aspects of aberration correction

41.8. Concluding remarks

42. Caustics and their Applications

42.1. Introduction

42.2. The concept of the caustic

42.3. The caustic of a round lens

42.4. The caustic of an astigmatic lens

42.5. Intensity considerations

42.6. Higher order focusing properties

42.7. Applications of annular systems

PART IX – ELECTRON GUNS

43. General Features of Electron Guns

43.1. Thermionic electron guns

43.2. Schottky emission guns

43.3. Cold field electron emission guns

43.4. Beam transport systems

44. Theory of Electron Emission

44.1. General relations

44.2. Transmission through a plane barrier

44.3. Thermionic electron emission

44.4. The tunnel effect

44.5. Field electron emission

44.6. Schottky emission

44.7. Concluding remarks

45. Pointed Cathodes without Space Charge

45.1. The spherical cathode

45.2. The diode approximation

45.3. Field calculation in electron sources with pointed cathodes

45.4. Simple models

46. Space Charge Effects

46.1. The spherical diode

46.2. Asymptotic properties and generalizations

46.3. Determination of the space charge

46.4. The Boersch effect

47. Brightness

47.1. Application of Liouville’s theorem

47.2. The maximum brightness

47.3. The influence of apertures

47.4. Lenz’s brightness theory

47.5. Measurement of the brightness

47.6. Coulomb interactions and brightness

47.7. Aberrations in the Theory of Brightness



48. Emittance

48.1. Trace space and hyperemittance

48.2. Two-dimensional emittances

48.3. Brightness and emittance

48.4. Emittance diagrams

49. Gun optics

49.1. The Fujita–Shimoyama theory

49.2. Rose's theory

49.3. Matching the paraxial approximation to a cathode surface

50. Complete Electron Guns

50.1. Justification of the point source model

50.2. The lens system in field emission devices

50.3. Hybrid emission

50.4. Conventional thermionic guns

50.5. Pierce guns

50.6. Multi-electron-beam systems

50.7. Carbon nanotube emitters

50.8. Further reading

PART X – SYSTEMS WITH A CURVED OPTIC AXIS

51. General Curvilinear Systems

51.1. Introduction of a curvilinear coordinate system

51.2. Series expansion of the potentials and fields

51.3. Variational principle and trajectory equations

51.4. Simplifying symmetries

51.5. Trajectory equations for symmetric configurations

51.6. Aberration theory

52. Magnetic Sector Fields

52.1. Introduction

52.2. Magnetic devices with a circular optic axis

52.3. Radial (horizontal) focusing for a particular model field

52.4. The linear dispersion

52.5. The axial (vertical) focusing

52.6. Fringing field effects

52.7. Aberration theory: the homogeneous field (n = 0)

52.8. Optimization procedures

52.9. Energy analysers and monochromators

53. Unified Theories of Ion Optical Systems

53.1. Introduction

53.2. Electrostatic prisms

53.3. A unified version of the theory

53.4. The literature of ion optics

Notes and References
Index

Product details

  • Edition: 2
  • Latest edition
  • Published: December 13, 2017
  • Language: English

About the authors

PH

Peter W. Hawkes

Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
Affiliations and expertise
Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, France

EK

Erwin Kasper

Erwin Kasper studied physics at the Universities of Münster and Tübingen (Germany), where he obtained his PhD in 1965 and the habilitation to teach physics in 1969. After scientific spells in the University of Tucson, Arizona (1966) and in Munich (1970), he resumed his research and teaching in the Institute of Applied Physics, University of Tübingen, where he was later appointed professor. He lectured on general physics and especially on electron optics. The subject of his research was theoretical electron optics and related numerical methods on which he published numerous papers. After his retirement in 1997, he published a book on numerical field calculation (2001).
Affiliations and expertise
Institute of Applied Physics, University of Tuebingen, Tuebingen, Germany

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