Single Chamber Processing

Implementation of gate stack integrated process through a cluster tool concept (A. Kermani et al.). Integrated processing tools for electronic materials (A.K. Sinha). Single wafer integrated processes by RT-LPMOCVD modules - Application in the manufacturing of InP-based laser devices (A. Katz, S.J. Pearton). Thin dielectric films integrated manufacturing on III-V materials: Plasma cleaning and light assisted chemical vapour deposition (O. Dulac, Y.I. Nissim). In-process control of silicide formation during rapid thermal processing (J.M. Dilhac et al.). Poly-emitter fabrication in a single vertical reactor clustered with HF vapor etching (M. Hendriks et al.). Low temperature in-situ cleaning of silicon wafers with an ultra high vacuum compatible plasma source (J. Ramm et al.). Radial control of the physical properties of RT-LPCVD polysilicon films deposited in a cylindrical cold wall reactor (B. Semmache et al.). In-situ process integration of polysilicon emitter stacks by rapid thermal multi-processing (I. Barsoni et al.). In-situ ellipsometry for real-time feedback control of oxidation furnaces (C. Schneider et al.). Critical issues for single-chamber manufacturing: The role of laser technology (D.J. Ehrlich). Fabrication and characterization of selectively grown Si1-xGex/Sip⁺/N heterojunctions using pulsed laser induced epitaxy and gas immersion laser doping (K.J. Kramer et al.). UV assisted oxydation of SiGe strained layers (V. Craciun et al.). A novel VUV photochemical deposition apparatus (C. Manfredotti et al.).