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Elsevier

Books in Physics

Physics titles offer comprehensive research and advancements across the fundamental and applied areas of physical science. From quantum mechanics and particle physics to astrophysics and materials science, these titles drive innovation and deepen understanding of the principles governing the universe. Essential for researchers, educators, and students, this collection supports scientific progress and practical applications across a diverse range of physics disciplines.

  • Instrumentation for Fluid Particle Flow

    • 1st Edition
    • S.L. Soo
    • English
    Some of the most original and productive research specialists in the field of particle-fluid flow systems are assembled in this book, which is an important and current reference volume. The book focuses on methods of measurement and options for engineers

  • Advances in Atomic, Molecular, and Optical Physics

    • 1st Edition
    • Volume 42
    • English
    This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics.

  • Advances in Imaging and Electron Physics

    • 1st Edition
    • Volume 111
    • Peter W. Hawkes
    • English
    Advances in Imaging & Electron Physics merges two long-running serials--Advances in Electronics & Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

  • Modern Map Methods in Particle Beam Physics

    • 1st Edition
    • Volume 108
    • English
    Advances in Imaging & Electron Physics merges two long-running serials--Advances in Electronics & Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

  • Advances in Imaging and Electron Physics

    • 1st Edition
    • Volume 110
    • Peter W. Hawkes
    • English
    Advances in Imaging & Electron Physics merges two long-running serials--Advances in Electronics & Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

  • Techniques and Challenges for 300 mm Silicon: Processing, Characterization, Modelling and Equipment

    • 1st Edition
    • Volume 81
    • H. Richter + 2 more
    • English
    The activities of the semiconductor industry to introduce a new, large wafer diameter were triggered by expected potential overall savings - cost and resource - and an anticipated increasing demand for Silicon wafers. In the beginning, around 1994, agreement on the diameter of the next wafer generation had to be achieved and finally 300 mm was globally accepted to be the next wafer diameter, a decision obtained at international summits in 1994/1995, based on the work of a SEMI task force. Several workshops on 300 mm wafers have been held by SEMI, JSNM and other organizations during the past few years. However, the present E-MRS conference on Techniques and Challenges for 300 mm Silicon: Processing, Characterization, Modeling and Equipment was the first international scientific conference about this subject. The papers - invited as well as submitted - cover a wide range of subjects, financial issues, fab concepts, crystal growth, wafer process development, material and defect issues, wafer characterization and provide an excellent review of the present status of 300 mm technology.

  • Handbook of Low and High Dielectric Constant Materials and Their Applications, Two-Volume Set

    • 1st Edition
    • Hari Singh Nalwa
    • English
    Recent developments in microelectronics technologies have created a great demand for interlayer dielectric materials with a very low dielectric constant. They will play a crucial role in the future generation of IC devices (VLSI/UISI and high speed IC packaging). Considerable efforts have been made to develop new low as well as high dielectric constant materials for applications in electronics industries. Besides achieving either low or high dielectric constants, other materials' properties such as good processability, high mechanical strength, high thermal and environmental stability, low thermal expansion, low current leakage, low moisture absorption, corrosion resistant, etc., are of equal importance. Many chemical and physical strategies have been employed to get desired dielectric materials with high performance. This is a rapidly growing field of science--both in novel materials and their applications to future packing technologies. The experimental data on inorganic and organic materials having low or high dielectric constant remail scattered in the literature. It is timely, therfore, to consolidate the current knowledge on low and high dielectric constant materials into a sigle reference source.Handbook of Low and High Dielectric Constant Materials and Their Applications is aimed at bringing together under a sigle cover (in two volumes) all low and high dielectric constant materials currently studied in academic and industrial research covering all spects of inorgani an organic materials from their synthetic chemistry, processing techniques, physics, structure-property relationship to applications in IC devices. This book will summarize the current status of the field covering important scientific developments made over the past decade with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source for all those interested in low and high dielectric constant material.

  • Understanding the Light Microscope

    A Computer-Aided Introduction
    • 1st Edition
    • D. J. Goldstein
    • English
    Understanding the Light Microscope consists of four original computer programs with an explanatory book. Author Dan Goldstein says using the programs can teach aspects of microscopy and diffraction often missed from formal courses, adding, "... what one non-mathematician has created should not be beyond the understanding of others!" The book aims to provide understanding at a level deeper than customary in existing texts and in a form accessible to microscope users, particularly biologists. It covers simple ray optics, the aberrations of "real" (thick) lenses, polarized light, and the influence of diffraction on imaging. The book can be read alone, but appreciation of its contents is greatly enhanced when used in conjunction with the programs.D J Goldstein was a Nuffield Dominion Travelling Fellow at Oxford University and a visiting Professor in Pittsburgh. He taught at the Universities of the Witwatersrand (Johannesburg, South Africa) and Sheffield (UK) while publishing research in embryology, histology, immunology, histochemistry and microscopy. Since retiring in 1989 as Reader in Anatomy at Sheffield University, he has been an independent research worker in biomedical science.

  • Paint and Surface Coatings

    Theory and Practice
    • 2nd Edition
    • R Lambourne + 1 more
    • English
    This second edition of an established and well received book has been carefully revised, in many instances by the original authors, and enlarged by the addition of two completely new chapters. These deal with the use of computers in the paint industry and with the increasingly important subject of health and safety. The chapter on pigments has also been re-written by an author new to this edition.It was the editor’s intention in the first edition to provide science graduates entering the paint industry with a bridge between academia and the applied science and technology of paints. The great strength and appeal of this book remains that it deals with the technology of paints and surface coatings while also providing a basic understanding of the chemistry and physics of coatings.

  • Free Electron Lasers 1998

    • 1st Edition
    • G.R. Neil + 1 more
    • English
    The FEL field has grown enormously over the last years, which is reflected in the number of papers presented at the 1998 conference. A few specific areas in FEL are particularly active. Several groups are investigating self-amplified spontaneous emission (SASE) as a route to 0.1 nm FEL. Although the technical challenges are large, a growing portion of the community believes this is a feasible goal and have begun planning 4th generation light sources based on this technique. Already, demonstrations of SASE by many orders of magnitude in an unguided (by external means) optical mode have been achieved in the IR with extension into the UV soon to follow. Other groups are extending the applications of FELs by evolutionary changes in the capabilities of user facilities around the world. Many of these utilize other sources of radiation synchronously with tunable FEL beams. An emerging trend is th use of Thompson scattered photons from the electron beam. Because of the Doppler shift involved, the photons can be up-scattered into the X-ray (keV) or even gamma ray (MeV) regime forming a useful picosecond probe for analysis of materials or nuclear structure. Other groups continue to extend the range of FEL operation and a new record was set this year for short wavelength lasing (210nm) as well as production of the highest CW average power yet for a FEL (311 W).This exhaustive volume will provide the reader with an appreciation of the state of FEL technology and convey also the sense of excitement and interest that exists in the field. Despite the fact that it has been 22 years since the first demonstration of lasing in a FEL oscillator, the field continues to provide interesting areas for study and application.

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