Skip to main content

Thin Films for Advanced Electronic Devices

Advances in Research and Development

  • 1st Edition, Volume 15 - February 26, 1991
  • Latest edition
  • Editors: John L. Vossen, Maurice H. Francombe
  • Language: English

In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive… Read more

World Book Day celebration

Where learning shapes lives

Up to 25% off trusted resources that support research, study, and discovery.

Description

In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive discussions of magnetostatic wave phenomena in epitaxial magnetic oxide films and their applications in microwave signal processing devices: Thin-film rare earth transition metal alloys for magnetooptic recording. Two new classes of quantum well structures that have been used for infrared detectors and ultrafast resonant tunneling devices. Recent applications of Fourier transform spectroscopy for the analysis of inorganic thin solid films. This book provides a focused treatment of recent developments in novel thin film solid state components, and specifically discusses magnetic, semiconducting, and optical phenomena.

Readership

Researchers, students, and engineers concerned with electronic materials and devices, thin film physics, and materials science.

Table of contents

J.D. Adam, M.R. Daniel, P. Emtage, and S.H. Talisa, Magnetostatic Waves. B.S. Krusor and G.A.N. Connell, Thin-Film Rare Earth-Transition Metal Alloys for Magneto-Optic Recording. D.D. Coon and K.M.S.V. Bandara, New Quantum Structures. D.M. Back, Fourier Transform Infrared Analysis of Thin Films.

Review quotes

"I have no doubt that this volume's section on new quantum structures will be of great interest to quantum device researchers."—DR. R.P.G. KARUNASIRI, UNIVERSITY OF CALIFORNIA, LOS ANGELES

Product details

  • Edition: 1
  • Latest edition
  • Volume: 15
  • Published: February 26, 1991
  • Language: English

About the editors

JV

John L. Vossen

Affiliations and expertise
RCA Laboratories, Princeton, New Jersey

MF

Maurice H. Francombe

Affiliations and expertise
Georgia State University, Atlanta, U.S.A.

View book on ScienceDirect

Read Thin Films for Advanced Electronic Devices on ScienceDirect