Thin Films for Advanced Electronic Devices
Advances in Research and Development
- 1st Edition, Volume 15 - February 26, 1991
- Latest edition
- Editors: John L. Vossen, Maurice H. Francombe
- Language: English
In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive… Read more
World Book Day celebration
Where learning shapes lives
Up to 25% off trusted resources that support research, study, and discovery.
Description
Description
In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive discussions of magnetostatic wave phenomena in epitaxial magnetic oxide films and their applications in microwave signal processing devices: Thin-film rare earth transition metal alloys for magnetooptic recording. Two new classes of quantum well structures that have been used for infrared detectors and ultrafast resonant tunneling devices. Recent applications of Fourier transform spectroscopy for the analysis of inorganic thin solid films. This book provides a focused treatment of recent developments in novel thin film solid state components, and specifically discusses magnetic, semiconducting, and optical phenomena.
Readership
Readership
Researchers, students, and engineers concerned with electronic materials and devices, thin film physics, and materials science.
Table of contents
Table of contents
J.D. Adam, M.R. Daniel, P. Emtage, and S.H. Talisa, Magnetostatic Waves. B.S. Krusor and G.A.N. Connell, Thin-Film Rare Earth-Transition Metal Alloys for Magneto-Optic Recording. D.D. Coon and K.M.S.V. Bandara, New Quantum Structures. D.M. Back, Fourier Transform Infrared Analysis of Thin Films.
Review quotes
Review quotes
"I have no doubt that this volume's section on new quantum structures will be of great interest to quantum device researchers."—DR. R.P.G. KARUNASIRI, UNIVERSITY OF CALIFORNIA, LOS ANGELES
Product details
Product details
- Edition: 1
- Latest edition
- Volume: 15
- Published: February 26, 1991
- Language: English
About the editors
About the editors
JV
John L. Vossen
Affiliations and expertise
RCA Laboratories, Princeton, New JerseyMF
Maurice H. Francombe
Affiliations and expertise
Georgia State University, Atlanta, U.S.A.View book on ScienceDirect
View book on ScienceDirect
Read Thin Films for Advanced Electronic Devices on ScienceDirect