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Thin Films for Emerging Applications

  • 1st Edition, Volume 16 - May 22, 1992
  • Latest edition
  • Editors: John L. Vossen, Maurice H. Francombe
  • Language: English

Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin… Read more

Description

Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.

Readership

Researchers, students, and engineers concerned with electronic and optical devices, thin film applications, and novel new materials such as High Tc Superconductors.

Table of contents

N.G. Dhere, High Tc Superconducting Thin Films. K.V. Reddy, Lateral Diffusion and Electromigration in Metallic Thin Films. F.J. Cadieu, Permanent Magnet Thin Films. P.H. Wojciechowski and M.S. Mendolia, Fracture and Cracking Phenomena in Thin Films Adhering to High-Elongation Substrates. Each chapter includes references. Index.

Product details

  • Edition: 1
  • Latest edition
  • Volume: 16
  • Published: October 22, 2013
  • Language: English

About the editors

JV

John L. Vossen

Affiliations and expertise
RCA Laboratories, Princeton, New Jersey

MF

Maurice H. Francombe

Affiliations and expertise
Georgia State University, Atlanta, U.S.A.

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